 he Contamet process is a direct metallization process based on tin/palladium colloids which are adsorbed to the surface. Subsequently the conductive layer is enforced by Cu-particles, giving a superior conductivity for acid copper plating. Contamet process is available for vertical and horizontal system.

直接金属化制程 — Contamet ; 使用锡鈀膠体系統, 膠体能均勻吸附于孔內非导电 层而型成导电膜. 同时以铜做为连結, 大幅提高导电膜之导电度, 有助于后续电镀铜之均勻覆蓋. Contamet制程适用于垂直或水平设备.

|